Transparent p-AlN:SnO2/n-SnO2tunnel diode

Chih Yi Hsieh, Po Ming Lee, Yen Ju Wu, Yen Shuo Liu, Ching Han Liao, Yu Shan Wei, Cheng Yi Liu

Research output: Contribution to journalArticlepeer-review


Using the diffusivity discrepancy between Al and N in the SnO2phase, N-doped n+and Al-doped p+degenerate regions were created at the interface by annealing an AlN/SnO2bilayer. Current-voltage (I-V) characteristics of the p+-AlN:SnO2/n+-SnO2junction indicate distinct tunnel diode characteristics, such as the tunneling mode, negative differential resistance, and turn-on mode. The overall transmittance of the p-AlN:SnO2/n-SnO2tunnel diode is higher than 80% in the visible region. In a certain wavelength region, the transmittance of the p-AlN:SnO2/n-SnO2tunnel diode is even higher than 90%. This shows that a transparent p-AlN:SnO2/n-SnO2tunnel diode has great potential for use in a broad range of invisible electronics.

Original languageEnglish
Article number092201
JournalApplied Physics Express
Issue number9
StatePublished - 1 Sep 2014


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