Tomography of the injection and acceleration processes of monoenergetic electrons in a laser wakefield accelerator

C. T. Hsieh, C. L. Chang, Y. C. Ho, Y. S. Chen, J. Y. Lin, J. Wang, S. Y. Chen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A tomographic method based on laser machining was used to resolve the electron injection and acceleration processes in a laser wakefield accelerator. It was found that all the electrons in the monoenergetic electron beam are injected at the same location in the plasma column and then accelerated with an acceleration gradient exceeding 2 GeV/cm. In addition, it was observed that there is no significant deceleration of the monoenergetic electron bunch after reaching the maximum energy and the injection position shifts with change of the position of pump-pulse focus. The results are consistent with the model of transverse wave-breaking and beam loading for injection of monoenergetic electrons. With this method the details of the underlying physical processes in a laser wakefield accelerator can be resolved and compared directly to the observations in particle-in-cell simulations.

Original languageEnglish
Title of host publicationADVANCED ACCELERATOR CONCEPTS
Subtitle of host publication12th Advanced Accelerator Concepts Workshop
Pages728-734
Number of pages7
DOIs
StatePublished - 2006
EventADVANCED ACCELERATOR CONCEPTS: 12th Advanced Accelerator Concepts Workshop - Lake Geneva, WI, United States
Duration: 10 Jul 200615 Jul 2006

Publication series

NameAIP Conference Proceedings
Volume877
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

ConferenceADVANCED ACCELERATOR CONCEPTS: 12th Advanced Accelerator Concepts Workshop
Country/TerritoryUnited States
CityLake Geneva, WI
Period10/07/0615/07/06

Keywords

  • Electron acceleration
  • Laser machining
  • Tomography

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