Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering

Peng Yang, Chia Chi Sung, Yiin Kuen Fuh, Chun Lin Chu, Chih Hung Lo

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

To improve the characteristics of a diamond-like carbon (DLC) film, Ti-containing amorphous hydrogenated carbon thin films were deposited on sus304 stainless steel substrates by high-power plasma-sputtering with titanium metal as the solid plasma source in a mixed ArC2H2 atmosphere. The films were fabricated to obtain a multilayered structure of Ti/TiC/DLC gradient for improving adhesion and reducing residual stress. The effects of substrate bias and target-substrate distance on the films' properties were studied by glow discharge spectroscope, X-ray diffractometer, Raman spectroscope, nanoindenter, and a pin-on-disk tribometer. The results indicate that the films possess superior adhesive strength and toughness.

Original languageEnglish
Pages (from-to)1381-1386
Number of pages6
JournalTransactions of Nonferrous Metals Society of China (English Edition)
Volume22
Issue number6
DOIs
StatePublished - Jun 2012

Keywords

  • Diamond-like carbon
  • High-power plasma-sputtering
  • Me-DLC

Fingerprint

Dive into the research topics of 'Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering'. Together they form a unique fingerprint.

Cite this