Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering

Peng Yang; Chia Chi Sung; Yiin Kuen Fuh; Chun Lin Chu; Chih Hung Lo

doi:10.1016/S1003-6326(11)61329-0

Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering

Peng Yang, Chia Chi Sung, Yiin Kuen Fuh, Chun Lin Chu, Chih Hung Lo

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

To improve the characteristics of a diamond-like carbon (DLC) film, Ti-containing amorphous hydrogenated carbon thin films were deposited on sus304 stainless steel substrates by high-power plasma-sputtering with titanium metal as the solid plasma source in a mixed ArC₂H₂ atmosphere. The films were fabricated to obtain a multilayered structure of Ti/TiC/DLC gradient for improving adhesion and reducing residual stress. The effects of substrate bias and target-substrate distance on the films' properties were studied by glow discharge spectroscope, X-ray diffractometer, Raman spectroscope, nanoindenter, and a pin-on-disk tribometer. The results indicate that the films possess superior adhesive strength and toughness.

Original language	English
Pages (from-to)	1381-1386
Number of pages	6
Journal	Transactions of Nonferrous Metals Society of China (English Edition)
Volume	22
Issue number	6
DOIs	https://doi.org/10.1016/S1003-6326(11)61329-0
State	Published - Jun 2012

Keywords

Diamond-like carbon
High-power plasma-sputtering
Me-DLC

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10.1016/S1003-6326(11)61329-0

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title = "Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering",

abstract = "To improve the characteristics of a diamond-like carbon (DLC) film, Ti-containing amorphous hydrogenated carbon thin films were deposited on sus304 stainless steel substrates by high-power plasma-sputtering with titanium metal as the solid plasma source in a mixed ArC2H2 atmosphere. The films were fabricated to obtain a multilayered structure of Ti/TiC/DLC gradient for improving adhesion and reducing residual stress. The effects of substrate bias and target-substrate distance on the films' properties were studied by glow discharge spectroscope, X-ray diffractometer, Raman spectroscope, nanoindenter, and a pin-on-disk tribometer. The results indicate that the films possess superior adhesive strength and toughness.",

keywords = "Diamond-like carbon, High-power plasma-sputtering, Me-DLC",

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T1 - Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering

AU - Yang, Peng

AU - Sung, Chia Chi

AU - Fuh, Yiin Kuen

AU - Chu, Chun Lin

AU - Lo, Chih Hung

PY - 2012/6

Y1 - 2012/6

N2 - To improve the characteristics of a diamond-like carbon (DLC) film, Ti-containing amorphous hydrogenated carbon thin films were deposited on sus304 stainless steel substrates by high-power plasma-sputtering with titanium metal as the solid plasma source in a mixed ArC2H2 atmosphere. The films were fabricated to obtain a multilayered structure of Ti/TiC/DLC gradient for improving adhesion and reducing residual stress. The effects of substrate bias and target-substrate distance on the films' properties were studied by glow discharge spectroscope, X-ray diffractometer, Raman spectroscope, nanoindenter, and a pin-on-disk tribometer. The results indicate that the films possess superior adhesive strength and toughness.

AB - To improve the characteristics of a diamond-like carbon (DLC) film, Ti-containing amorphous hydrogenated carbon thin films were deposited on sus304 stainless steel substrates by high-power plasma-sputtering with titanium metal as the solid plasma source in a mixed ArC2H2 atmosphere. The films were fabricated to obtain a multilayered structure of Ti/TiC/DLC gradient for improving adhesion and reducing residual stress. The effects of substrate bias and target-substrate distance on the films' properties were studied by glow discharge spectroscope, X-ray diffractometer, Raman spectroscope, nanoindenter, and a pin-on-disk tribometer. The results indicate that the films possess superior adhesive strength and toughness.

KW - Diamond-like carbon

KW - High-power plasma-sputtering

KW - Me-DLC

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Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering

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