@inproceedings{4013488225894380aff1b68f3777f1cf,
title = "Thin-film growth rate monitor by normal-incidence reflectance",
abstract = "An in situ technique for monitoring the growth rate and optical constants of the thin semiconductor layer by the normal-incidence reflectance is proposed. To demonstrate the feasibility of the proposed method, the variation of the air gap between two glasses is used to simulate growth system. We also used the spin coater to thin the thickness of the salad oil to test the performance of the measurement system. The experiments indicate that we can determine the thickness variation and optical constants of the test sample in real time.",
keywords = "Growth rate, MOCVD, Reflectance, Thin film",
author = "Huang, {Fu Rong} and Chen, {Xu Dong} and Wang, {Chun Cheng} and Lee, {Ju Yi}",
note = "Publisher Copyright: {\textcopyright} (2015) Trans Tech Publications, Switzerland.; International Conference on Machining, Materials and Mechanical Technologies, IC3MT 2014 ; Conference date: 31-08-2014 Through 05-09-2014",
year = "2015",
doi = "10.4028/www.scientific.net/KEM.656-657.107",
language = "???core.languages.en_GB???",
isbn = "9783038354956",
series = "Key Engineering Materials",
publisher = "Trans Tech Publications Ltd",
pages = "107--112",
editor = "Jyh-Chen Chen and Usuki Hiroshi and Sheng-Wei Lee and Yiin-Kuen Fuh",
booktitle = "Recent Development in Machining, Materials and Mechanical Technologies",
}