The RTN measurement technique on leakage path finding in advanced high-k metal gate CMOS devices

E. R. Hsieh, P. Y. Lu, Steve S. Chung, J. C. Ke, C. W. Yang, C. T. Tsai, T. R. Yew

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

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Engineering & Materials Science