The measurement of the misalignment induced aberration of a miniature lens

Hung Sheng Chang, Chao Wen Liang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

The manufacturing errors of an optical system are in different types of tolerance categories. Among these tolerance categories, the optical surface figure error and the surface / element alignment errors are the two most important factors in determining the optical system performance. In the large optics, the optical surface figure error is typically the dominating factor while the alignment are, for most of time, the most critical factor in the miniature optics. However, the optical testing of the miniature optics alignment is difficult and sometimes nearly impossible to be achieved properly. The misaligned lens element induce the unsymmetrical optical aberration spanning throughout the optical field. This type of aberrations usually dominates near the edge of the field if the misalignment is near its tolerance limit. We proposed a novel method utilizing an ultra-high dynamic range wavefront sensor (UHDR-WFS) to measure the off-axis aberrations of a miniature lens near its field edge. The unsymmetrical aberration is measured by spin-scanning the optical field of the tested miniature lens along the azimuthal direction. A F/2.0 optical beam out of a miniature lens is measured directly without using any collimator. The preliminary test result showing that the constant coma aberration are the dominating aberration of a misaligned miniature lens. The measurement result does matches our expectation from the simulation in the ray tracing software.

Original languageEnglish
Title of host publicationOptical System Alignment, Tolerancing, and Verification XII
EditorsJose Sasian, Richard N. Youngworth
PublisherSPIE
ISBN (Electronic)9781510620650
DOIs
StatePublished - 2018
EventOptical System Alignment, Tolerancing, and Verification XII 2018 - San Diego, United States
Duration: 19 Aug 201820 Aug 2018

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10747
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOptical System Alignment, Tolerancing, and Verification XII 2018
Country/TerritoryUnited States
CitySan Diego
Period19/08/1820/08/18

Keywords

  • Aberration
  • Alignment
  • Wavefront sensor

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