The fabrication and property evaluation of Zr-Ti-B-Si thin film metallic glass materials

Yu Lun Deng, Jyh Wei Lee, Bih Show Lou, Jenq Gong Duh, Jinn P. Chu, Jason Shian Ching Jang

Research output: Contribution to journalArticlepeer-review

22 Scopus citations


Recently, the thin film metallic glass materials have attracted much attention due to their amorphous structure and unique properties. In this work, four Zr-Ti-B-Si thin film metal glasses (TFMGs) were fabricated on Si wafer and AISI 420 stainless steel disk substrates using four pure targets by a co-sputtering system. The power of Si target was adjusted to achieve TFMGs with different Si contents. The amorphous phase of TFMG was determined by X-ray diffractometer (XRD) and high resolution transmission electron microscopy (TEM). When the Si content was higher than 12.9. at.%, the dense and featureless microstructures of thin films were produced. Very high hardness, beyond 10. GPa, was obtained for Zr-Ti-B-Si TFMG containing high Si content. The excellence in corrosion resistance of Zr-Ti-B-Si TFMGs was confirmed by the potentiodynamic polarization test in 5.0. wt.% NaCl aqueous solution. It can be concluded that the Si content showed a positive influence on the hardness, adhesion and anti-corrosion performance of the Zr-Ti-B-Si thin film metallic glass.

Original languageEnglish
Pages (from-to)115-122
Number of pages8
JournalSurface and Coatings Technology
Issue numberPB
StatePublished - 2014


  • Corrosion resistance
  • Nanoindentation
  • Potentiodynamic polarization test
  • Scratch test
  • Zr-Ti-B-Si thin film metallic glass


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