The Demonstration of Gate Dielectric-fuse 4kb OTP Memory Feasible for Embedded Applications in High-k Metal-gate CMOS Generations and beyond

E. R. Hsieh, C. W. Chang, C. C. Chuang, H. W. Chen, Steve S. Chung

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

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Engineering & Materials Science

Chemical Compounds