@inproceedings{db6e9a55400a4d29b940683fbf8c580a,
title = "The application of a heating baffle in a high temperature vacuum reactor",
abstract = "The temperature uniformity of thin film process is an important issue for susceptor in high temperature vacuum system. When the temperature of process is extremely high the uniformity is not only difficult to control, but also hard to maintain. In order to raise the temperature utilization at high temperature which is higher than 1300°C, the heating baffle is introduced for this purpose. As the result, the thermal radiation is economized about 1% in the chamber which contains six pieces of two-inch wafers. On the other hand, the heating baffle also improves the temperature uniformity of the wafer area on susceptor. The results show the temperature difference decreases to 6°C after using the heating baffle, and it shows that an optimum temperature uniformity can be achieved in a self-assembly reactor.",
author = "Chen, {Kuei Fang} and Chiu, {Jun Ching} and Hu, {Chih Kai} and Li, {Tomi T.} and Tung, {Pi Chen}",
note = "Publisher Copyright: {\textcopyright} 2017 IEEE.; null ; Conference date: 12-03-2017 Through 13-03-2017",
year = "2017",
month = may,
day = "4",
doi = "10.1109/CSTIC.2017.7919904",
language = "???core.languages.en_GB???",
series = "China Semiconductor Technology International Conference 2017, CSTIC 2017",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Steve Liang and Ying Shi and Ru Huang and Qinghuang Lin and David Huang and Hanming Wu and Yuchun Wang and Cor Claeys and Kafai Lai and Ying Zhang and Peilin Song and Viyu Shi and Zhen Guo",
booktitle = "China Semiconductor Technology International Conference 2017, CSTIC 2017",
}