An anti-reflection nano-patterned silicon substrate (NPSiS) has been demonstrated by using self-assembly the single layer nano-sphere and ICP etching process. The average reflectivity of the NPSiS could be reduced to 0.79%.
|Title of host publication||Optical Interference Coatings, OIC 2013|
|State||Published - 2013|
|Event||Optical Interference Coatings, OIC 2013 - Whistler, Canada|
Duration: 16 Jun 2013 → 21 Jun 2013
|Name||Optics InfoBase Conference Papers|
|Conference||Optical Interference Coatings, OIC 2013|
|Period||16/06/13 → 21/06/13|