Suppression fresnel reflection of nano-patterned silicon substrate formed by monolayer nanospheres

Chang Rong Lin, Chia Hua Chan, Shao Ze Tseng, Chii Chang Chen, Sheng Hui Chen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

An anti-reflection nano-patterned silicon substrate (NPSiS) has been demonstrated by using self-assembly the single layer nano-sphere and ICP etching process. The average reflectivity of the NPSiS could be reduced to 0.79%.

Original languageEnglish
Title of host publicationOptical Interference Coatings, OIC 2013
StatePublished - 2013
EventOptical Interference Coatings, OIC 2013 - Whistler, Canada
Duration: 16 Jun 201321 Jun 2013

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceOptical Interference Coatings, OIC 2013
Country/TerritoryCanada
CityWhistler
Period16/06/1321/06/13

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