Supported zeolite membrane by vapor-phase regrowth

C. S. Tsay, A. S.T. Chiang

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

A new method for preparing supported zeolite membrane is proposed. A layer of colloidal MFI zeolite is deposited on a porous ultrafiltration support, on which a silica barrier layer has been precoated. The composite is then heated at 100°C under saturate water vapor for 30 h to obtain a very thin zeolite membrane with a glassy look. Under SEM, the zeolite membrane exhibits obvious void when the particles deposited were 100 x 150 nm in size. The particles are packed much closer if 80 x 100-nm particles were used. With smaller (60 x 80 nm) particles, the boundary between particles fuses together, and a continuous zeolite membrane could therefore be prepared. The membrane thickness could also be reduced by depositing less colloidal zeolite for regrowth to obtain a continuous zeolite membrane as thin as 0.5 μm on top of a multilayer porous alumina support. Some preferred orientation of the elliptical zeolite particles is observed on the surface of the membrane, but no preferred crystallography orientation is confirmed. The reproducibility of this preparation method was checked by room temperature permeation measurements of several gases. Nearly identical results were obtained on two separately prepared membranes. Permeation results also confirmed that there were very few, if not free of, pinholes in the zeolite membrane so prepared.

Original languageEnglish
Pages (from-to)616-625
Number of pages10
JournalAIChE Journal
Volume46
Issue number3
DOIs
StatePublished - Mar 2000

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