Abstract
Two sets of source target which consist of ZrCuAlNiV and ZrTiAlNiV, respectively were selected as the target materials for preparing a series of thin film coatings on the 304 stainless steel substrate by DC pulse magnetron sputtering process. The microstructures of these as-prepared ZrCuAlNiV and ZrTiAlNiV thin films were examined by X-ray diffraction and TEM observation. In parallel, the characteristic analysis of these ZrCuAlNiV and ZrTiAlNiV alloy thin films including surface roughness, and corrosion resistance were analyzed by atomic force microscopy (AFM), and tested by electrochemical method as well as salt spray testing, respectively. The results showed that the ZrCuAlNiV thin film exhibits a typical amorphous microstructure and smooth surface with average roughness about 1 nm. The ZrCuAlNiV thin film performs similar corrosion resistance to 304 stainless steel according to the result of salt spray testing in 5% NaCl solution. Additionally, the AC impedance value of ZrCuAlNiV is 20 times than 316L stainless steel and 4 times than ZrTiAlNiV, implying that the ZrCuAlNiV thin film has better corrosion resistance than the others owing to its amorphous state.
| Original language | English |
|---|---|
| Pages (from-to) | 4930-4933 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 517 |
| Issue number | 17 |
| DOIs | |
| State | Published - 1 Jul 2009 |
Keywords
- Metallic glass
- Physical vapor deposition (PVD)
- Thin films