Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization
- Bo Yi Lin
- , Wei Bo Liao
- , Cheng Chung Jaing
- , Ya Chen Chang
- , Ching Long Cheng
- , Cheng Chung Lee
- , Chien Cheng Kuo
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review