Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization

Bo Yi Lin, Wei Bo Liao, Cheng Chung Jaing, Ya Chen Chang, Ching Long Cheng, Cheng Chung Lee, Chien Cheng Kuo

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


SiOx:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.

Original languageEnglish
Title of host publicationOptical Interference Coatings, OIC 2016
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580132
StatePublished - 2016
EventOptical Interference Coatings, OIC 2016 - Tucson, United States
Duration: 19 Jun 201624 Jun 2016

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701


ConferenceOptical Interference Coatings, OIC 2016
Country/TerritoryUnited States


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