Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization

Bo Yi Lin; Wei Bo Liao; Cheng Chung Jaing; Ya Chen Chang; Ching Long Cheng; Cheng Chung Lee; Chien Cheng Kuo

doi:10.1364/oic.2016.wb.7

Stress analysis of SiO_x: C films deposited by HMDSO/O₂ plasma polymerization

Bo Yi Lin, Wei Bo Liao, Cheng Chung Jaing, Ya Chen Chang, Ching Long Cheng, Cheng Chung Lee, Chien Cheng Kuo

Department of Optics and Photonics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

SiO_x:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.

Original language	English
Title of host publication	Optical Interference Coatings, OIC 2016
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Print)	9781943580132
DOIs	https://doi.org/10.1364/oic.2016.wb.7
State	Published - 2016
Event	Optical Interference Coatings, OIC 2016 - Tucson, United States Duration: 19 Jun 2016 → 24 Jun 2016

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Conference

Conference	Optical Interference Coatings, OIC 2016
Country/Territory	United States
City	Tucson
Period	19/06/16 → 24/06/16

Access to Document

10.1364/oic.2016.wb.7

Cite this

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title = "Stress analysis of SiOx: C films deposited by HMDSO/O2 plasma polymerization",

abstract = "SiOx:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.",

author = "Lin, {Bo Yi} and Liao, {Wei Bo} and Jaing, {Cheng Chung} and Chang, {Ya Chen} and Cheng, {Ching Long} and Lee, {Cheng Chung} and Kuo, {Chien Cheng}",

note = "Publisher Copyright: {\textcopyright} OSA 2016.; Optical Interference Coatings, OIC 2016 ; Conference date: 19-06-2016 Through 24-06-2016",

year = "2016",

doi = "10.1364/oic.2016.wb.7",

language = "???core.languages.en_GB???",

isbn = "9781943580132",

series = "Optics InfoBase Conference Papers",

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booktitle = "Optical Interference Coatings, OIC 2016",

}

Lin, BY, Liao, WB, Jaing, CC, Chang, YC, Cheng, CL, Lee, CC & Kuo, CC 2016, Stress analysis of SiO_x: C films deposited by HMDSO/O₂ plasma polymerization. in Optical Interference Coatings, OIC 2016. Optics InfoBase Conference Papers, Optica Publishing Group (formerly OSA), Optical Interference Coatings, OIC 2016, Tucson, United States, 19/06/16. https://doi.org/10.1364/oic.2016.wb.7

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T2 - Optical Interference Coatings, OIC 2016

AU - Lin, Bo Yi

AU - Liao, Wei Bo

AU - Jaing, Cheng Chung

AU - Chang, Ya Chen

AU - Cheng, Ching Long

AU - Lee, Cheng Chung

AU - Kuo, Chien Cheng

PY - 2016

Y1 - 2016

N2 - SiOx:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.

AB - SiOx:C plasma polymer film can effectively reduce the stress of the multilayer film by adjusted process parameters. The average transmittance in visible light is 90% and the stress of the multilayers was reduced 63.5 %.

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U2 - 10.1364/oic.2016.wb.7

DO - 10.1364/oic.2016.wb.7

M3 - 會議論文篇章

AN - SCOPUS:85086057033

SN - 9781943580132

T3 - Optics InfoBase Conference Papers

BT - Optical Interference Coatings, OIC 2016

PB - Optica Publishing Group (formerly OSA)

Y2 - 19 June 2016 through 24 June 2016

ER -