Simulation of amorphous silicon thin-film transistor including adapted Gummel method

Yao Tsung Tsai, Li Chung Huang

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

This paper presents an adapted Gummel method (AGM) used in the two-dimensional device simulation of an amorphous-silicon (a-Si) thin-film transistor (TFT). Firstly, the AGM for amorphous silicon is developed by modifying the Gummel method (GM) for crystalline silicon. Secondly, the AGM is implemented into a two-dimensional device simulator for the simulation of a-Si TFTs. The simulation results show that the AGM converges well while the GM fails to converge for the simulation of a-Si TFTs. Hence, the AGM is a useful technique for the simulation and analysis of a-Si TFTs.

Original languageEnglish
Pages (from-to)3-11
Number of pages9
JournalInternational Journal of Numerical Modelling: Electronic Networks, Devices and Fields
Volume10
Issue number1
DOIs
StatePublished - Jan 1997

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