Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property

Chun Tse Wu, Yao-Li Liu, Po Yen Lai, Shih Hung Chen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO:A and T 2023
PublisherOptical Society of America
ISBN (Electronic)9781957171258
DOIs
StatePublished - 2023
EventCLEO: Applications and Technology, CLEO:A and T 2023 - Part of Conference on Lasers and Electro-Optics 2023 - San Jose, United States
Duration: 7 May 202312 May 2023

Publication series

NameCLEO: Applications and Technology, CLEO:A and T 2023

Conference

ConferenceCLEO: Applications and Technology, CLEO:A and T 2023 - Part of Conference on Lasers and Electro-Optics 2023
Country/TerritoryUnited States
CitySan Jose
Period7/05/2312/05/23

Fingerprint

Dive into the research topics of 'Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property'. Together they form a unique fingerprint.

Cite this