Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property

Chun Tse Wu; Yao Li Liu; Po Yen Lai; Shih Hung Chen

Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property

Chun Tse Wu, Yao Li Liu, Po Yen Lai, Shih Hung Chen

Department of Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.

Original language	English
Title of host publication	2023 Conference on Lasers and Electro-Optics, CLEO 2023
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781957171258
State	Published - 2023
Event	2023 Conference on Lasers and Electro-Optics, CLEO 2023 - San Jose, United States Duration: 7 May 2023 → 12 May 2023

Publication series

Name	2023 Conference on Lasers and Electro-Optics, CLEO 2023

Conference

Conference	2023 Conference on Lasers and Electro-Optics, CLEO 2023
Country/Territory	United States
City	San Jose
Period	7/05/23 → 12/05/23

Cite this

Wu, C. T., Liu, Y. L., Lai, P. Y., & Chen, S. H. (2023). Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property. In 2023 Conference on Lasers and Electro-Optics, CLEO 2023 Article JTu2A.12 (2023 Conference on Lasers and Electro-Optics, CLEO 2023). Institute of Electrical and Electronics Engineers Inc..

Wu, Chun Tse ; Liu, Yao Li ; Lai, Po Yen et al. / Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property. 2023 Conference on Lasers and Electro-Optics, CLEO 2023. Institute of Electrical and Electronics Engineers Inc., 2023. (2023 Conference on Lasers and Electro-Optics, CLEO 2023).

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title = "Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property",

abstract = "Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.",

author = "Wu, {Chun Tse} and Liu, {Yao Li} and Lai, {Po Yen} and Chen, {Shih Hung}",

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Wu, CT, Liu, YL, Lai, PY & Chen, SH 2023, Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property. in 2023 Conference on Lasers and Electro-Optics, CLEO 2023., JTu2A.12, 2023 Conference on Lasers and Electro-Optics, CLEO 2023, Institute of Electrical and Electronics Engineers Inc., 2023 Conference on Lasers and Electro-Optics, CLEO 2023, San Jose, United States, 7/05/23.

Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property. / Wu, Chun Tse; Liu, Yao Li; Lai, Po Yen et al.
2023 Conference on Lasers and Electro-Optics, CLEO 2023. Institute of Electrical and Electronics Engineers Inc., 2023. JTu2A.12 (2023 Conference on Lasers and Electro-Optics, CLEO 2023).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property

AU - Wu, Chun Tse

AU - Liu, Yao Li

AU - Lai, Po Yen

AU - Chen, Shih Hung

PY - 2023

Y1 - 2023

N2 - Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.

AB - Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.

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M3 - 會議論文篇章

AN - SCOPUS:85176361693

T3 - 2023 Conference on Lasers and Electro-Optics, CLEO 2023

BT - 2023 Conference on Lasers and Electro-Optics, CLEO 2023

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2023 Conference on Lasers and Electro-Optics, CLEO 2023

Y2 - 7 May 2023 through 12 May 2023

ER -

Wu CT, Liu YL, Lai PY, Chen SH. Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property. In 2023 Conference on Lasers and Electro-Optics, CLEO 2023. Institute of Electrical and Electronics Engineers Inc. 2023. JTu2A.12. (2023 Conference on Lasers and Electro-Optics, CLEO 2023).

Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property

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