SiGe quantum rings by ultra-high vacuum chemical vapor deposition

C. H. Lee, C. M. Lin, C. W. Liu, H. T. Chang, S. W. Lee, P. Shushpannikov, V. A. Gorodtsov, R. V. Goldstein

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

SiGe quanrum rings (QRs) grown at 500°C and 600°C were observed on SiGe quantum dots (QDs) capped with Si. Average depth and diameter are 9 nm and 185 nm, respectively, for QRs at 500°C, while those are 0.9 nm and 84 nm for QRs at 600°C. Ge out-diffusion mechanism is proposed to be responsible for nanorings formation at 500°C, and Si surface diffusion toward strain-free edges is proposed to be responsible for nanorings formation at 600°C. Raman spectroscopy suggests that formation of QRs at 600°C is closely correlated with a strain-driven process. QRs grown at 600°C are the metastable states and can be only observed in very limited conditions. Both thick cap and high thermal budget can destroy SiGe nanorings structures.

Original languageEnglish
Title of host publicationECS Transactions - SiGe, Ge, and Related Compounds 3
Subtitle of host publicationMaterials, Processing, and Devices
PublisherElectrochemical Society Inc.
Pages647-657
Number of pages11
Edition10
ISBN (Print)9781566776561
DOIs
StatePublished - 2009
Event3rd SiGe, Ge, and Related Compounds: Materials, Processing and Devices Symposium - 214th ECS Meeting - Honolulu, HI, United States
Duration: 12 Oct 200817 Oct 2008

Publication series

NameECS Transactions
Number10
Volume16
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference3rd SiGe, Ge, and Related Compounds: Materials, Processing and Devices Symposium - 214th ECS Meeting
Country/TerritoryUnited States
CityHonolulu, HI
Period12/10/0817/10/08

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