Abstract
In this study, a hollow optical waveguide with omni-directional reflectors in silicon-based materials was design, fabricated and characterized. By using dry etching technique, plasma-enhanced chemical vapor deposition for Si/SiO 2 thin films and covering another wafer with omni-directional reflector together, the waveguides can be formed with an air core of 1.2μm × 1.3μm. A uniform propagation loss of the waveguide to be around 1.7dB/cm for C+L band was found for the TE and TM modes. Polarization- independent hollow optical waveguides were obtained with the hollow waveguide structure.
| Original language | English |
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| Pages (from-to) | 6589-6593 |
| Number of pages | 5 |
| Journal | Optics Express |
| Volume | 12 |
| Issue number | 26 |
| DOIs | |
| State | Published - Dec 2004 |