Semiconductor hollow optical waveguides formed by omni-directional reflectors

Shih Shou Lo, Mou Sian Wang, Chii Chang Chen

Research output: Contribution to journalArticlepeer-review

66 Scopus citations


In this study, a hollow optical waveguide with omni-directional reflectors in silicon-based materials was design, fabricated and characterized. By using dry etching technique, plasma-enhanced chemical vapor deposition for Si/SiO 2 thin films and covering another wafer with omni-directional reflector together, the waveguides can be formed with an air core of 1.2μm × 1.3μm. A uniform propagation loss of the waveguide to be around 1.7dB/cm for C+L band was found for the TE and TM modes. Polarization- independent hollow optical waveguides were obtained with the hollow waveguide structure.

Original languageEnglish
Pages (from-to)6589-6593
Number of pages5
JournalOptics Express
Issue number26
StatePublished - Dec 2004


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