@inproceedings{b44bb84f25574035a22dcad800e5f219,
title = "Scream for multi-level movable structures by inductively coupled plasma process",
abstract = "A novel fabrication process to etch, to passivate, and to release single-crystal silicon structures totally in just only one process by inductively coupled plasma reactive ion etching (ICP-RIE) has been presented in this paper. Several kinds of movable actuators such as relay, comb-drive, and capacitance with thickness of 30• m have been fabricated successfully to demonstrate this fabrication process. Here, experimental investigations about fabrication parameters to get well profile and suspension structures are performed in a STS ICP-RIE system.",
keywords = "Actuators, Inductively coupled plasma reactive ion etching (ICP-RIE), Micro-Electro-Mechanical systems (MEMS)",
author = "Lin, {Yu Hsin} and Yin, {Hung Ling} and Hsu, {Yung Yu} and Hu, {Yi Chiuen} and Chou, {Hsiao Yu} and Yang, {Tsung Hsun}",
year = "2002",
doi = "10.1115/IMECE2002-33382",
language = "???core.languages.en_GB???",
isbn = "0791836428",
series = "ASME International Mechanical Engineering Congress and Exposition, Proceedings",
publisher = "American Society of Mechanical Engineers (ASME)",
pages = "347--350",
booktitle = "Microelectromechanical Systems",
}