Response to "comment on 'Evaluation of the spatial distribution of series and shunt resistance of a solarcell using dark lock-in thermography'" [J. Appl. Phys. 116, 046101 (2014)]

Te Yuan Chung; Ching Hsiao Arthur Cheng; Chung Hao Wang

doi:10.1063/1.4891524

Response to "comment on 'Evaluation of the spatial distribution of series and shunt resistance of a solarcell using dark lock-in thermography'" [J. Appl. Phys. 116, 046101 (2014)]

Te Yuan Chung, Ching Hsiao Arthur Cheng, Chung Hao Wang

Research output: Contribution to journal › Comment/debate

Original language	English
Article number	046102
Journal	Journal of Applied Physics
Volume	116
Issue number	4
DOIs	https://doi.org/10.1063/1.4891524
State	Published - 28 Jul 2014

Access to Document

10.1063/1.4891524

Cite this

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Response to "comment on 'Evaluation of the spatial distribution of series and shunt resistance of a solarcell using dark lock-in thermography'" [J. Appl. Phys. 116, 046101 (2014)]. / Chung, Te Yuan ; Cheng, Ching Hsiao Arthur; Wang, Chung Hao.
In: Journal of Applied Physics, Vol. 116, No. 4, 046102, 28.07.2014.

Research output: Contribution to journal › Comment/debate

TY - JOUR

T1 - Response to "comment on 'Evaluation of the spatial distribution of series and shunt resistance of a solarcell using dark lock-in thermography'" [J. Appl. Phys. 116, 046101 (2014)]

AU - Chung, Te Yuan

AU - Cheng, Ching Hsiao Arthur

AU - Wang, Chung Hao

PY - 2014/7/28

Y1 - 2014/7/28

UR - http://www.scopus.com/inward/record.url?scp=84905837037&partnerID=8YFLogxK

U2 - 10.1063/1.4891524

DO - 10.1063/1.4891524

M3 - 評論/辯論

AN - SCOPUS:84905837037

SN - 0021-8979

VL - 116

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 4

M1 - 046102

ER -