Quantum electronic stability of atomically uniform films

D. A. Luh, T. Miller, J. J. Paggel, M. Y. Chou, T. C. Chiang

Research output: Contribution to journalArticlepeer-review

157 Scopus citations


We have studied the structural stability of thin silver films with thicknesses of N = 1 to 15 monolayers, deposited on an Fe(100) substrate. Photoemission spectroscopy results show that films of N = 1, 2, and 5 monolayer thicknesses are structurally stable for temperatures above 800 kelvin, whereas films of other thicknesses are unstable and bifurcate into a film with N ± 1 monolayer thicknesses at temperatures around 400 kelvin. The results are in agreement with theoretical predictions that consider the electronic energy of the quantum well associated with a particular film thickness as a significant contribution to the film stability.

Original languageEnglish
Pages (from-to)1131-1133
Number of pages3
Issue number5519
StatePublished - 11 May 2001


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