Process study of chemically vapour-deposited SnOx (x≈2) films

J. C. Lou, M. S. Lin, J. I. Chyi, J. H. Shieh

Research output: Contribution to journalArticlepeer-review

27 Scopus citations

Abstract

The physical characteristics of SnOx(x≈2) films deposited onto Pyrex glass substrates by chemical vapour deposition are studied. The temperature dependence indicates that films deposited at 600 °C have good polycrystallinity. The electrical conductivity of the 600 °C films is mainly controlled by the variation in the SnCl4 vapour flow rate. A subsequent thermal annealing process can even reduce the sheet resistance to 400ω/□. In addition, the visible absorption shows that the 600 °C films tend to lose their transparency in the short wavelength range of the visible spectrum.

Original languageEnglish
Pages (from-to)163-173
Number of pages11
JournalThin Solid Films
Volume106
Issue number3
DOIs
StatePublished - 19 Aug 1983

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