Polybenzoxazine as a mold-release agent for nanoimprint lithography

Chih Feng Wang, Shih Feng Chiou, Fu Hsiang Ko, Jem Kun Chen, Cheng Tung Chou, Chih Feng Huang, Shiao Wei Kuo, Feng Chih Chang

Research output: Contribution to journalArticlepeer-review

66 Scopus citations


One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.

Original languageEnglish
Pages (from-to)5868-5871
Number of pages4
Issue number11
StatePublished - 22 May 2007


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