Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell

Chien Chang Chao; Chih Ming Wang; Yia Chung Chang; Jenq Yang Chang

doi:10.1007/s10043-009-0064-x

Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell

Chien Chang Chao, Chih Ming Wang, Yia Chung Chang, Jenq Yang Chang

Department of Optics and Photonics

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

A plasmonic multilayer structure (PMS) is proposed for photovoltaic cells with an ultrathin active layer that is 30 nm amorphous Si (α-Si). The optical properties of the PMS are analyzed by rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) method. Using the PMS, the incident light can be trapped into localized surface plasmon (LSP) and then the localized surface plasmon induces the surface plasmon (SP) that propagates transversely within the α-Si layer. Compared with the indium tin oxide (ITO)/α-Si/Ag structure, the photon number absorbed by PMS increase 28.7% while a normal incident transverse magnetic (TM) polarization wave is applied.

Original language	English
Pages (from-to)	343-346
Number of pages	4
Journal	Optical Review
Volume	16
Issue number	3
DOIs	https://doi.org/10.1007/s10043-009-0064-x
State	Published - May 2009

Keywords

Amorphous silicon
Photovoltaic
Plasmonic multilayer
Surface plasmons

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10.1007/s10043-009-0064-x

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title = "Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell",

abstract = "A plasmonic multilayer structure (PMS) is proposed for photovoltaic cells with an ultrathin active layer that is 30 nm amorphous Si (α-Si). The optical properties of the PMS are analyzed by rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) method. Using the PMS, the incident light can be trapped into localized surface plasmon (LSP) and then the localized surface plasmon induces the surface plasmon (SP) that propagates transversely within the α-Si layer. Compared with the indium tin oxide (ITO)/α-Si/Ag structure, the photon number absorbed by PMS increase 28.7% while a normal incident transverse magnetic (TM) polarization wave is applied.",

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T1 - Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell

AU - Chao, Chien Chang

AU - Wang, Chih Ming

AU - Chang, Yia Chung

AU - Chang, Jenq Yang

PY - 2009/5

Y1 - 2009/5

N2 - A plasmonic multilayer structure (PMS) is proposed for photovoltaic cells with an ultrathin active layer that is 30 nm amorphous Si (α-Si). The optical properties of the PMS are analyzed by rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) method. Using the PMS, the incident light can be trapped into localized surface plasmon (LSP) and then the localized surface plasmon induces the surface plasmon (SP) that propagates transversely within the α-Si layer. Compared with the indium tin oxide (ITO)/α-Si/Ag structure, the photon number absorbed by PMS increase 28.7% while a normal incident transverse magnetic (TM) polarization wave is applied.

AB - A plasmonic multilayer structure (PMS) is proposed for photovoltaic cells with an ultrathin active layer that is 30 nm amorphous Si (α-Si). The optical properties of the PMS are analyzed by rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) method. Using the PMS, the incident light can be trapped into localized surface plasmon (LSP) and then the localized surface plasmon induces the surface plasmon (SP) that propagates transversely within the α-Si layer. Compared with the indium tin oxide (ITO)/α-Si/Ag structure, the photon number absorbed by PMS increase 28.7% while a normal incident transverse magnetic (TM) polarization wave is applied.

KW - Amorphous silicon

KW - Photovoltaic

KW - Plasmonic multilayer

KW - Surface plasmons

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U2 - 10.1007/s10043-009-0064-x

DO - 10.1007/s10043-009-0064-x

M3 - 期刊論文

AN - SCOPUS:67149090604

SN - 1340-6000

VL - 16

SP - 343

EP - 346

JO - Optical Review

JF - Optical Review

IS - 3

ER -

Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell

Abstract

Keywords

UN SDGs

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