Plasma diagnostics of resonance magnetic field effects on a-Si:H thin films deposition using electron cyclotron resonance plasma

L. C. Hu, Y. W. Lin, C. J. Wang, T. C. Wei, C. R. Yang, C. C. Lee, J. Y. Chang, I. C. Chen, Tomi T. Li

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Chemical Engineering

Material Science