Optimal use of analog and binary lithography for planar-integrated free-space optics fabrication

Matthias Gruber, An Chi Wei, Jürgen Jahns

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

For the fabrication of planar-integrated free-space optical (PIFSO) systems binary or analog lithography-based techniques can be used. The optimal choice or combination depends on system parameters like the targeted functionality, efficiency, reliability, and production cost. Our discussion is based on theoretical and experimental work in the field of optical interconnects.

Original languageEnglish
Title of host publicationFrontiers in Optics, FiO-2004
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)1557527792
StatePublished - 2004
EventFrontiers in Optics, FiO-2004 - Rochester, United States
Duration: 12 Oct 2004 → …

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceFrontiers in Optics, FiO-2004
Country/TerritoryUnited States
CityRochester
Period12/10/04 → …

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