@inproceedings{1a74414c84bf40dda9ebe8a6cccaad98,
title = "Optical system to extract reflection coefficients and optical admittances of a thin film stack and its application in coating monitoring",
abstract = "An optical system to extract the reflection coefficient and optical admittance of film stack is presented. Both reflection phase and reflection magnitude intensity from the tested film stack were measured under normal incidence of the light. Two dimensional refractive index and thickness distribution of each layer in multilayer thin films can be obtained by the analysis of the reflection coefficients or optical admittance of multi-wavelengths. A novel monitoring method for the thin film deposition using the reflection coefficient and optical admittance loci as the thickness grows is also proposed to achieve better performance in this article.",
keywords = "Dynamic interferometer, Optical admittance, Optical constants, Thin film",
author = "Lee, {Cheng Chung} and Kai Wu and Chen, {Yu Jen} and Kuo, {Chien Cheng}",
year = "2011",
doi = "10.1117/12.898963",
language = "???core.languages.en_GB???",
isbn = "9780819487988",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Optical Complex Systems, OCS11",
note = "Optical Complex Systems, OCS11 ; Conference date: 05-09-2011 Through 08-09-2011",
}