Nanopatterned silicon substrate use in heterojunction thin film solar cells made by magnetron sputtering

Shao Ze Tseng; Chang Rong Lin; Hung Sen Wei; Chia Hua Chan; Sheng Hui Chen

doi:10.1155/2014/707543

Nanopatterned silicon substrate use in heterojunction thin film solar cells made by magnetron sputtering

Shao Ze Tseng, Chang Rong Lin, Hung Sen Wei, Chia Hua Chan, Sheng Hui Chen

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si: H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm² and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO₂ nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer.

Original language	English
Article number	707543
Journal	International Journal of Photoenergy
Volume	2014
DOIs	https://doi.org/10.1155/2014/707543
State	Published - 2014

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title = "Nanopatterned silicon substrate use in heterojunction thin film solar cells made by magnetron sputtering",

abstract = "This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si: H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm2 and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO2 nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer.",

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T1 - Nanopatterned silicon substrate use in heterojunction thin film solar cells made by magnetron sputtering

AU - Tseng, Shao Ze

AU - Lin, Chang Rong

AU - Wei, Hung Sen

AU - Chan, Chia Hua

AU - Chen, Sheng Hui

PY - 2014

Y1 - 2014

N2 - This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si: H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm2 and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO2 nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer.

AB - This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si: H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm2 and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO2 nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer.

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SN - 1110-662X

VL - 2014

JO - International Journal of Photoenergy

JF - International Journal of Photoenergy

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Nanopatterned silicon substrate use in heterojunction thin film solar cells made by magnetron sputtering

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