Nanopatterned silicon substrate use in heterojunction thin film solar cells made by magnetron sputtering

Shao Ze Tseng, Chang Rong Lin, Hung Sen Wei, Chia Hua Chan, Sheng Hui Chen

Research output: Contribution to journalArticlepeer-review

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Abstract

This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si: H/n-type c-Si structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm2 and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO2 nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer.

Original languageEnglish
Article number707543
JournalInternational Journal of Photoenergy
Volume2014
DOIs
StatePublished - 2014

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