Nano-structured diffractive optical elements on SiNX membrane for UV-visible regime applications

Chien Chieh Lee; Chih Ming Wang; Che Lung Xu; Jing Yi Chen; Jenq Yang Chang; Yi Ming Liao; Gou Chung Chi

doi:10.1117/12.559296

Nano-structured diffractive optical elements on SiN_X membrane for UV-visible regime applications

Chien Chieh Lee, Chih Ming Wang, Che Lung Xu, Jing Yi Chen, Jenq Yang Chang, Yi Ming Liao, Gou Chung Chi

Research output: Contribution to journal › Conference article › peer-review

5 Scopus citations

Abstract

Silicon nitride (SiN_X) film is a commonly used material in silicon technology. In addition, it has excellent optical properties. It is transparent in both the UV and visible range, with a high refractive index of about 1.7-2. Owing to its superior mechanical and optical properties, we used a silicon nitride membrane as an optical phase element. We will fabricate nano-structured diffractive optical elements, such as wave-plate, polarizer, and polarized beam splitter on SiNXHY membrane by e-beam lithography for the UV-visible regime applications. The SiNXHY membranes were made from SiNXHY films deposited by an plasma enhanced chemical vapor deposition (PECVD) as an alternative method for low stress membrane fabrication used in UV-visible transmittance. The stress of silicon nitride film showed a change from compressive to tensile with increasing working pressure during film deposition. The UV-visible transmittance of the free standing membrane was measured, which showed that UV light is transparent at wavelength as short as 240nm. We will show the feasibility to fabricate nano-structured diffractive optical elements on the SiNXHY membrane combined with microoptoelectromechanical systems (MOEMS) technology for the application in the UV-visible regimes.

Original language	English
Article number	26
Pages (from-to)	170-179
Number of pages	10
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5515
DOIs	https://doi.org/10.1117/12.559296
State	Published - 2004
Event	Nanoengineering: Fabrication, Properties, Optics, and Devices - Denver, CO, United States Duration: 4 Aug 2004 → 6 Aug 2004

Keywords

Diffractive optical elements
Microoptoelectromechanical systems
SiNx membrane
UV
Visible

Access to Document

10.1117/12.559296

Cite this

@article{77c79646859c4a9eb1d25cc49cedd1ed,

title = "Nano-structured diffractive optical elements on SiNX membrane for UV-visible regime applications",

abstract = "Silicon nitride (SiNX) film is a commonly used material in silicon technology. In addition, it has excellent optical properties. It is transparent in both the UV and visible range, with a high refractive index of about 1.7-2. Owing to its superior mechanical and optical properties, we used a silicon nitride membrane as an optical phase element. We will fabricate nano-structured diffractive optical elements, such as wave-plate, polarizer, and polarized beam splitter on SiNXHY membrane by e-beam lithography for the UV-visible regime applications. The SiNXHY membranes were made from SiNXHY films deposited by an plasma enhanced chemical vapor deposition (PECVD) as an alternative method for low stress membrane fabrication used in UV-visible transmittance. The stress of silicon nitride film showed a change from compressive to tensile with increasing working pressure during film deposition. The UV-visible transmittance of the free standing membrane was measured, which showed that UV light is transparent at wavelength as short as 240nm. We will show the feasibility to fabricate nano-structured diffractive optical elements on the SiNXHY membrane combined with microoptoelectromechanical systems (MOEMS) technology for the application in the UV-visible regimes.",

keywords = "Diffractive optical elements, Microoptoelectromechanical systems, SiNx membrane, UV, Visible",

author = "Lee, {Chien Chieh} and Wang, {Chih Ming} and Xu, {Che Lung} and Chen, {Jing Yi} and Chang, {Jenq Yang} and Liao, {Yi Ming} and Chi, {Gou Chung}",

year = "2004",

doi = "10.1117/12.559296",

language = "???core.languages.en_GB???",

volume = "5515",

pages = "170--179",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

note = "Nanoengineering: Fabrication, Properties, Optics, and Devices ; Conference date: 04-08-2004 Through 06-08-2004",

}

TY - JOUR

T1 - Nano-structured diffractive optical elements on SiNX membrane for UV-visible regime applications

AU - Lee, Chien Chieh

AU - Wang, Chih Ming

AU - Xu, Che Lung

AU - Chen, Jing Yi

AU - Chang, Jenq Yang

AU - Liao, Yi Ming

AU - Chi, Gou Chung

PY - 2004

Y1 - 2004

N2 - Silicon nitride (SiNX) film is a commonly used material in silicon technology. In addition, it has excellent optical properties. It is transparent in both the UV and visible range, with a high refractive index of about 1.7-2. Owing to its superior mechanical and optical properties, we used a silicon nitride membrane as an optical phase element. We will fabricate nano-structured diffractive optical elements, such as wave-plate, polarizer, and polarized beam splitter on SiNXHY membrane by e-beam lithography for the UV-visible regime applications. The SiNXHY membranes were made from SiNXHY films deposited by an plasma enhanced chemical vapor deposition (PECVD) as an alternative method for low stress membrane fabrication used in UV-visible transmittance. The stress of silicon nitride film showed a change from compressive to tensile with increasing working pressure during film deposition. The UV-visible transmittance of the free standing membrane was measured, which showed that UV light is transparent at wavelength as short as 240nm. We will show the feasibility to fabricate nano-structured diffractive optical elements on the SiNXHY membrane combined with microoptoelectromechanical systems (MOEMS) technology for the application in the UV-visible regimes.

AB - Silicon nitride (SiNX) film is a commonly used material in silicon technology. In addition, it has excellent optical properties. It is transparent in both the UV and visible range, with a high refractive index of about 1.7-2. Owing to its superior mechanical and optical properties, we used a silicon nitride membrane as an optical phase element. We will fabricate nano-structured diffractive optical elements, such as wave-plate, polarizer, and polarized beam splitter on SiNXHY membrane by e-beam lithography for the UV-visible regime applications. The SiNXHY membranes were made from SiNXHY films deposited by an plasma enhanced chemical vapor deposition (PECVD) as an alternative method for low stress membrane fabrication used in UV-visible transmittance. The stress of silicon nitride film showed a change from compressive to tensile with increasing working pressure during film deposition. The UV-visible transmittance of the free standing membrane was measured, which showed that UV light is transparent at wavelength as short as 240nm. We will show the feasibility to fabricate nano-structured diffractive optical elements on the SiNXHY membrane combined with microoptoelectromechanical systems (MOEMS) technology for the application in the UV-visible regimes.

KW - Diffractive optical elements

KW - Microoptoelectromechanical systems

KW - SiNx membrane

KW - UV

KW - Visible

UR - http://www.scopus.com/inward/record.url?scp=13244267023&partnerID=8YFLogxK

U2 - 10.1117/12.559296

DO - 10.1117/12.559296

M3 - 會議論文

AN - SCOPUS:13244267023

SN - 0277-786X

VL - 5515

SP - 170

EP - 179

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 26

T2 - Nanoengineering: Fabrication, Properties, Optics, and Devices

Y2 - 4 August 2004 through 6 August 2004