Modeling the reaction of PQ:DMNA/PMMA photopolymer recorded at 640 nm

PO JUNG LIN, YU HUA HSIEH, TE YUAN CHUNG

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The reaction model and the corresponding equations of PQ:DMNA/PMMA photopolymer recording at 640 nm are proposed. A series of experiments were conducted to estimate the parameters used in the equations by measuring only the dynamic behavior of the diffraction efficiency of the recorded grating. Recording the PQ:DMNA/PMMA grating can then be well-predicted and match with the experiment.

Original languageEnglish
Pages (from-to)2608-2617
Number of pages10
JournalOptical Materials Express
Volume11
Issue number8
DOIs
StatePublished - 1 Aug 2021

Fingerprint

Dive into the research topics of 'Modeling the reaction of PQ:DMNA/PMMA photopolymer recorded at 640 nm'. Together they form a unique fingerprint.

Cite this