Optical elements, such as grating, holographic optical element and Fresnel lens, are made on the SiN membrane. The SiN film was deposited on the silicon wafer by low pressure chemical vapor deposition (LPCVD). Its advantages include the high transmission efficiency, light weight, and easy packaging for the Si-based optical pickup head.
|Number of pages||10|
|Journal||Proceedings of SPIE - The International Society for Optical Engineering|
|State||Published - 2003|
|Event||Lithographic and Micromachining Techniques for Optical Component Fabrication II - San Diego, CA, United States|
Duration: 3 Aug 2003 → 4 Aug 2003
- Anisotropic etching
- SiN film