| Original language | English |
|---|---|
| Pages | 132-142 |
| Number of pages | 11 |
| State | Published - 1983 |
MAGNETRON ENHANCED REACTIVE ION ETCHING OF SiO//2 AND Si.
I. Lin, D. C. Hinson, W. H. Class, R. L. Sandstrom, F. Pasierb
Research output: Contribution to conference › Paper › peer-review
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