MAGNETRON ENHANCED REACTIVE ION ETCHING OF SiO//2 AND Si.

I. Lin, D. C. Hinson, W. H. Class, R. L. Sandstrom, F. Pasierb

Research output: Contribution to conferencePaperpeer-review

6 Scopus citations
Original languageEnglish
Pages132-142
Number of pages11
StatePublished - 1983

Cite this