| Original language | English |
|---|---|
| Pages (from-to) | 254-255 |
| Number of pages | 2 |
| Journal | Electrochemical Society Extended Abstracts |
| Volume | 83-1 |
| State | Published - 1983 |
MAGNETRON ENHANCED REACTIVE ION ETCHING OF SiO//2.
I. Lin, D. Hinson, W. Class, R. Sandstron
Research output: Contribution to journal › Conference article › peer-review
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