Kinetic modeling of the NF3 decomposition via dielectric barrier discharges in N2/NF3 mixtures

Hsin Liang Chen, How Ming Lee, Moo Been Chang

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12 Scopus citations


Emission of PFCs (perfluorocompound) has attracted mich attention in recent years due to its relatively high contribution to the global warming. Non-thermal plasma is one of the most promising technologies to effectively control the PFC emissions. In this study, a cylindrical DBD (dielectric barrier discharge) reactor is adopted for the treatment of NF3-containing streams. Besides the experimental work, a numerical model is also developed for better understanding of the reaction mechanism of NF3 abatement in N2/NF3 mixtures. Good agreement is observed between the experimental data and the simulation results. Simulation results indicate that the electrons and the N atoms are the major active s clos responsible for the NF3 decomposition. In addition, N2(A3u+) metastables plays a significant role in the NF3 abatement. A simplified mechanism for the NF3 decomposition in the N2 - NF3 plasmas is proposed as well. A figure is presented. Reaction mechanisms for the decomposition of NF3 in a N2 - NF3 plasma.

Original languageEnglish
Pages (from-to)682-691
Number of pages10
JournalPlasma Processes and Polymers
Issue number9
StatePublished - 17 Nov 2006


  • Air pollution control technologies
  • Greenhouse gases (GHGs)
  • N(A∑)
  • Nitrogen trifluoride (NF)
  • Non-thermal plasmas (NTP)
  • Perfluorocompound (PFC)


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