Abstract
Stressed C-V measurement was used to extract the trap profiles in AlGaN/GaN HFETs with field plates enduring high-voltage off-state stress. The C-V measurement results also correlated with the degradation in dynamic on-resistance (RDS,on) after transistors were stressed with similar stress conditions. Based on the correlation between the trap profiles and dynamic RDS,on degradation, the location with high electric field that determines the major degradation is determined. Finally, a new source field plate is proposed and demonstrated to improve the dynamic performance degradation.
Original language | English |
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Pages (from-to) | 1099-1103 |
Number of pages | 5 |
Journal | Physica Status Solidi (A) Applications and Materials Science |
Volume | 212 |
Issue number | 5 |
DOIs | |
State | Published - 1 May 2015 |
Keywords
- AlGaN
- C-V characteristics
- GaN
- charge trapping
- field plates
- heterostructure field-effect transistor