Investigation of the optical property and structure of WO3 thin films with different sputtering depositions

Hsi Chao Chen, Der Jun Jan, Chien Han Chen, Kuo Ting Huang, Yen Ming Lo, Sheng Hui Chen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

The purpose of this research was to compare the optical properties and structure of tungsten oxide (WO3) thin films that was deposited by different sputtering depositions. WO3 thin films deposited by two different depositions of direct current (DC) magnetron sputtering and pulsed DC sputtering. A 99.95% WO3 target was used as the starting material for these depositions. These WO3 thin films were deposited on the ITO glass, PET and silicon substrate by different ratios of oxygen and argon. A shadow moiré interferometer would be introduced to measure the residual stress for PET substrate. RF magnetron sputtering had the large residual stress than the other's depositions. A Raman spectrum could exhibit the phase of oxidation of WO3 thin film by different depositions. At the ratio of oxygen and argon was about 1:1, and the WO3 thin films had the best oxidation. However, it was important at the change of the transmittance (△T = Tbleached - Tcolored) between the coloring and bleaching for the smart window. Therefore, we also found the WO3 thin films had the large variation of transmittance between the coloring and bleaching at the gas ratios of oxygen and argon of 1:1.

Original languageEnglish
Title of host publicationAdvances in Optical Thin Films IV
DOIs
StatePublished - 2011
EventAdvances in Optical Thin Films IV - Marseille, France
Duration: 5 Sep 20117 Sep 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8168
ISSN (Print)0277-786X

Conference

ConferenceAdvances in Optical Thin Films IV
Country/TerritoryFrance
CityMarseille
Period5/09/117/09/11

Keywords

  • Direct current (DC) magnetron sputtering
  • Flexible electrochromic
  • Pulsed DC sputtering
  • Raman spectra
  • Tungsten oxide (WO)

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