@inproceedings{cd600408440a4a41a681b379269a7d3b,
title = "Investigation of intrinsic hydrogenated amorphous silicon (a-Si:H) thin films on textured silicon substrate with high quality passivation",
abstract = "In this study, the intrinsic hydrogenated amorphous silicon (a-Si:H) thin films deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) was investigated for the application of the heterojunction silicon solar cell on the textured silicon substrate. During the process, we used the optical emission spectrometer (OES) and quadrupole mass spectrometry (QMS) to analyze the concentrations of free radicals in plasma. The results showed that the better surface recombination velocity (SRV) and passivation quality of a-Si:H thin films on the textured silicon substrate were obtained when the electrode distance at PECVD was 35mm. Furthermore, while the electrode distance was 35mm, the lowest electron temperature and the same spectrum ratio trend in OES (Si∗/SiH∗) and QMS (SiH2/SiH3) respectively were received.",
author = "Yu, {Min Lun} and Hsieh, {Yu Lin} and Jou, {Sheng Kai} and Li, {Tomi T.} and Lee, {Chien Chieh}",
note = "Publisher Copyright: {\textcopyright} 2017 IEEE.; 2017 China Semiconductor Technology International Conference, CSTIC 2017 ; Conference date: 12-03-2017 Through 13-03-2017",
year = "2017",
month = may,
day = "4",
doi = "10.1109/CSTIC.2017.7919801",
language = "???core.languages.en_GB???",
series = "China Semiconductor Technology International Conference 2017, CSTIC 2017",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Steve Liang and Ying Shi and Ru Huang and Qinghuang Lin and David Huang and Hanming Wu and Yuchun Wang and Cor Claeys and Kafai Lai and Ying Zhang and Peilin Song and Viyu Shi and Zhen Guo",
booktitle = "China Semiconductor Technology International Conference 2017, CSTIC 2017",
}