Investigation of electron cyclotron resonance chemical vapor deposition process for a-Si:H deposition, film characterization and in situ plasma diagnostics
L. C. Hu, C. J. Wang, Y. W. Lin, T. C. Wei, C. C. Lee, J. Y. Chang, I. C. Chen, Y. Kawai, T. T. Li
Research output: Contribution to journal › Article › peer-review
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