Investigation of electron cyclotron resonance chemical vapor deposition process for a-Si:H deposition, film characterization and in situ plasma diagnostics

L. C. Hu, C. J. Wang, Y. W. Lin, T. C. Wei, C. C. Lee, J. Y. Chang, I. C. Chen, Y. Kawai, T. T. Li

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5 Scopus citations

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Material Science