High reflectivity and thermal-stability Cr-based reflectors and n-type Ohmic contact for GaN-based flip-chip light-emitting diodes

Kuang Po Hsueh, Kuo Chun Chiang, Charles J. Wang, Yue Ming Hsin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We have investigated the thermal stability of three composite metals on their contact resistivities and luminous intensities for using as the reflector in flip-chip light-emitting diode (FCLED). The composite metals were simultaneously deposited on n-type GaN without alloy to form n-type Ohmic contact and simplify the process. The investigated composite metals were Ti/Al/Ti/Au (30/500/30/300 nm), Cr/Al/Cr/Au (30/500/30/300 nm) and Cr/Ti/Au (500/30/300 nm), respectively. The specific contact resistivity of Ti/Al/Ti/Au, Cr/Al/Cr/Au and Cr/Ti/Au on the n-type GaN Ohmic contact were changed from 5.4×10-4, 6.6×10-4 and 7.7×10 -4 Ω-cm2 to 5.3×10-4, 4.5×10-4 and 1.3×10-4 Ω-cm2 respectively after 500 hours thermal stress at 150°C in the air. After 96 hours of thermal stress, the luminous intensities at 20 mA of these three structures were decreased 6.2%, 11.1% and 1.4%, respectively. Therefore, in addition to maintain good n-type ohmic contact and simplify the process, the Cr/Ti/Au composite metal demonstrates good thermal stability as a reflector in FCLED.

Original languageEnglish
Title of host publicationGallium Nitride Materials and Devices
DOIs
StatePublished - 2006
EventGallium Nitride Materials and Devices - San Jose, CA, United States
Duration: 23 Jan 200625 Jan 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6121
ISSN (Print)0277-786X

Conference

ConferenceGallium Nitride Materials and Devices
Country/TerritoryUnited States
CitySan Jose, CA
Period23/01/0625/01/06

Keywords

  • Al
  • Cr
  • FCLED
  • Flip-chip light-emitting diode
  • GaN

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