High dislocation density of tin induced by electric current

Yi Han Liao, Chien Lung Liang, Kwang Lung Lin, Albert T. Wu

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A dislocation density of as high as 1017 /m2 in a tin strip, as revealed by high resolution transmission electron microscope, was induced by current stressing at 6.5 x 103 A/ cm2. The dislocations exist in terms of dislocation line, dislocation loop, and dislocation aggregates. Electron Backscattered Diffraction images reflect that the high dislocation density induced the formation of low deflection angle subgrains, high deflection angle Widmanstätten grains, and recrystallization. The recrystallization gave rise to grain refining.

Original languageEnglish
Article number127210
JournalAIP Advances
Issue number12
StatePublished - 1 Dec 2015


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