High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization

Ying Ja Chen; Yi Chun Chen; Chau Hwang Lee; Jyhpyng Wang

High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization

Ying Ja Chen
, Yi Chun Chen
, Chau Hwang Lee
, Jyhpyng Wang

Department of Physics

Research output: Contribution to conference › Paper › peer-review

2 Scopus citations

Abstract

High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

Original language	English
Pages	252-253
Number of pages	2
State	Published - 2002
Event	Conference on Lasers and Electro-Optics (CLEO 2002) - Long Beach, CA, United States Duration: 19 May 2002 → 24 May 2002

Conference

Conference	Conference on Lasers and Electro-Optics (CLEO 2002)
Country/Territory	United States
City	Long Beach, CA
Period	19/05/02 → 24/05/02

Cite this

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title = "High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization",

abstract = "High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35\% the diffraction limit and an aspect ratio close to 4 were produced.",

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year = "2002",

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T1 - High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization

AU - Chen, Ying Ja

AU - Chen, Yi Chun

AU - Lee, Chau Hwang

AU - Wang, Jyhpyng

PY - 2002

Y1 - 2002

N2 - High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

AB - High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

UR - https://www.scopus.com/pages/publications/0036459501

M3 - 會議論文

AN - SCOPUS:0036459501

SP - 252

EP - 253

T2 - Conference on Lasers and Electro-Optics (CLEO 2002)

Y2 - 19 May 2002 through 24 May 2002

ER -

High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization

Abstract

Conference

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