Abstract
In this work, growth of AlInN and its application to AlInN/GaN metal-oxide-semiconductor high electron mobility transistors are investigated. It is found that a GaN cap on AlInN layer improves the transistor's off-state breakdown voltage (VB) and on-state resistance (Ron).
Original language | English |
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Pages (from-to) | 3-8 |
Number of pages | 6 |
Journal | ECS Transactions |
Volume | 61 |
Issue number | 4 |
DOIs | |
State | Published - 2014 |
Event | Symposium on Wide Bandgap Semiconductor Materials and Devices 15 - 225th ECS Meeting - Orlando, United States Duration: 11 May 2014 → 15 May 2014 |