Keyphrases
Atomic Layer Deposition
50%
Common Gate
100%
Competitive Strength
50%
Computational Fluid Dynamics
100%
Concentration Field
50%
Cost Reduction
50%
Cross-layer Analysis
50%
Deposited Material
50%
Deposition Rate
50%
Device Fabrication
50%
Device Performance
50%
Device-independent
50%
Dielectric Properties
50%
Electric Performance
50%
Electrical Analysis
50%
Fin Field-effect Transistor (FinFET)
100%
Formation Rate
50%
GaAs Substrate
50%
Gas Flow
50%
Ge Substrate
50%
Leakage Current Density
50%
Low-frequency Measurement
50%
Manufacturing Process
100%
Measurement Instrument
50%
Numerical Simulation
100%
Oxide Semiconductor
50%
Physical Mechanism
50%
Pressure Field
50%
Process Simulation
100%
Semiconductor Industry
50%
Thermal Atomic Layer Deposition
50%
Thermal Concentration
50%
Thermal Field
50%
Thermal Mechanism
50%
Thermal Pressure
50%
Three-dimensional (3D)
50%
Three-dimensional Devices
50%
Transistor
100%
Trapped Charge
50%
Engineering
Atomic Layer Deposition
100%
Computational Fluid Dynamics
100%
Computer Simulation
100%
Concentration Field
50%
Deposited Material
50%
Deposition Rate
50%
Device Performance
50%
Dielectrics
50%
Experimental Observation
50%
Field-Effect Transistor
100%
Gaas Substrate
50%
Gas Flow
50%
Ge Substrate
50%
Manufacturing Process
100%
Model System
50%
Optimal Condition
50%
Oxide Semiconductor
50%
Pressure Distribution
50%
Process Simulation
100%
Thermal Field
50%
Material Science
Computational Fluid Dynamics
100%
Density
50%
Device Fabrication
50%
Dielectric Property
50%
Field Effect Transistor
100%
Film
100%
Gallium Arsenide
50%
Gas Flow
50%
Oxide Semiconductor
50%
Transistor
100%
Chemical Engineering
Atomic Layer Deposition
100%
Deposition Rate
50%
Film
100%
Oxide Semiconductors
50%