In this work, diffractive microlenses were fabricated in GaN-based material by using gravy-level mask and inductively coupled plasma etching technique. We also propose to insert the GaN/AlN anti-reflection thin films in the microlenses to enhance the ultraviolet/visible rejection ratio. Due to high transparency of GaN and AlN in UV, the microlenses can be potentially used in the UV micro-optics system such as solar-blind detection applications. In the design example of this work, the structure may enhance the ultraviolet/visible rejection to be 102.
|Title of host publication
|CLEO/Pacific Rim 2003 - 5th Pacific Rim Conference on Lasers and Electro-Optics
|Subtitle of host publication
|Photonics Lights Innovation, from Nano-Structures and Devices to Systems and Networks, Proceedings
|Institute of Electrical and Electronics Engineers Inc.
|Number of pages
|Published - 2003
|5th Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 2003 - Taipei, Taiwan
Duration: 15 Dec 2003 → 19 Dec 2003
|Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
|5th Pacific Rim Conference on Lasers and Electro-Optics, CLEO/Pacific Rim 2003
|15/12/03 → 19/12/03