GaN Diffractive microlens fabricated with gray-level mask

Chii Chang Chen, Ming Hung Li, Chih Yang Chang, Gou Chung Chi, Jenq Yang Chang, Wei Tai Cheng, Jui Hung Yeh, Chuck Wu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We present the design and the fabrication of the GaN diffractive mcirolens by gray-level mask and inductively coupled plasma etching. The microlens was designed for the application of high-density optical data storage. The calculation results show that the high-numerical-aperture GaN diffractive microlens could be achieved by using the gray-level mask. The fabrication of the GaN diffractive microlens has been demonstrated for the first time. The advantage of using GaN as the material of the diffractive microlens is discussed.

Original languageEnglish
Title of host publicationDiffractive Optics and Micro-Optics, DOMO 2002
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)1557527105
StatePublished - 2002
EventDiffractive Optics and Micro-Optics, DOMO 2002 - Tucson, United States
Duration: 3 Jun 20026 Jun 2002

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceDiffractive Optics and Micro-Optics, DOMO 2002
Country/TerritoryUnited States
CityTucson
Period3/06/026/06/02

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