Fabrication of high-NA GaN diffractive microlenses

Chii Chang Chen, Ming Hung Li, Chih Yang Chang, Gou Chung Chi, Jenq Yang Chang, Wei Tai Cheng, Jui Hung Yeh, Chuck Wu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

We present the fabrication of the high-numerical-aperture GaN diffractive microlenses by gray-level mask and inductively coupled plasma etching. (NA=0.85) The microlenses were designed for the application of high-density optical data storage. The advantage of using GaN as the material of the diffractive microlenses is discussed.

Original languageEnglish
Title of host publication2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages67-68
Number of pages2
ISBN (Electronic)0780375955, 9780780375956
DOIs
StatePublished - 2002
EventIEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Lugano, Switzerland
Duration: 20 Aug 200223 Aug 2002

Publication series

Name2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest

Conference

ConferenceIEEE/LEOS International Conference on Optical MEMs, OMEMS 2002
Country/TerritorySwitzerland
CityLugano
Period20/08/0223/08/02

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