Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

Y. T. Chen; T. N. Lo; C. W. Chiu; J. Y. Wang; C. L. Wang; C. J. Liu; S. R. Wu; S. T. Jeng; C. C. Yang; J. Shiue; C. H. Chen; Y. Hwu; G. C. Yin; H. M. Lin; J. H. Je; G. Margaritondo

doi:10.1107/S0909049507063510

Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

Y. T. Chen, T. N. Lo, C. W. Chiu, J. Y. Wang, C. L. Wang, C. J. Liu, S. R. Wu, S. T. Jeng, C. C. Yang, J. Shiue, C. H. Chen, Y. Hwu, G. C. Yin, H. M. Lin, J. H. Je, G. Margaritondo

Department of Physics

Research output: Contribution to journal › Article › peer-review

31 Scopus citations

Abstract

The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.

Original language	English
Pages (from-to)	170-175
Number of pages	6
Journal	Journal of Synchrotron Radiation
Volume	15
Issue number	2
DOIs	https://doi.org/10.1107/S0909049507063510
State	Published - 19 Feb 2008

Keywords

E-beam lithography
Electrodeposition
Fresnel zone plate
Nanofabrication
X-ray microscope

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Chen, Y. T., Lo, T. N., Chiu, C. W., Wang, J. Y., Wang, C. L., Liu, C. J., Wu, S. R., Jeng, S. T., Yang, C. C., Shiue, J., Chen, C. H., Hwu, Y., Yin, G. C., Lin, H. M., Je, J. H., & Margaritondo, G. (2008). Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating. Journal of Synchrotron Radiation, 15(2), 170-175. https://doi.org/10.1107/S0909049507063510

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title = "Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating",

abstract = "The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.",

keywords = "E-beam lithography, Electrodeposition, Fresnel zone plate, Nanofabrication, X-ray microscope",

author = "Chen, {Y. T.} and Lo, {T. N.} and Chiu, {C. W.} and Wang, {J. Y.} and Wang, {C. L.} and Liu, {C. J.} and Wu, {S. R.} and Jeng, {S. T.} and Yang, {C. C.} and J. Shiue and Chen, {C. H.} and Y. Hwu and Yin, {G. C.} and Lin, {H. M.} and Je, {J. H.} and G. Margaritondo",

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doi = "10.1107/S0909049507063510",

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T1 - Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

AU - Chen, Y. T.

AU - Lo, T. N.

AU - Chiu, C. W.

AU - Wang, J. Y.

AU - Wang, C. L.

AU - Liu, C. J.

AU - Wu, S. R.

AU - Jeng, S. T.

AU - Yang, C. C.

AU - Shiue, J.

AU - Chen, C. H.

AU - Hwu, Y.

AU - Yin, G. C.

AU - Lin, H. M.

AU - Je, J. H.

AU - Margaritondo, G.

PY - 2008/2/19

Y1 - 2008/2/19

N2 - The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.

AB - The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.

KW - E-beam lithography

KW - Electrodeposition

KW - Fresnel zone plate

KW - Nanofabrication

KW - X-ray microscope

UR - http://www.scopus.com/inward/record.url?scp=40049106623&partnerID=8YFLogxK

U2 - 10.1107/S0909049507063510

DO - 10.1107/S0909049507063510

M3 - 期刊論文

AN - SCOPUS:40049106623

SN - 0909-0495

VL - 15

SP - 170

EP - 175

JO - Journal of Synchrotron Radiation

JF - Journal of Synchrotron Radiation

IS - 2

ER -

Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

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Keywords

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