Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

Y. T. Chen, T. N. Lo, C. W. Chiu, J. Y. Wang, C. L. Wang, C. J. Liu, S. R. Wu, S. T. Jeng, C. C. Yang, J. Shiue, C. H. Chen, Y. Hwu, G. C. Yin, H. M. Lin, J. H. Je, G. Margaritondo

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30 Scopus citations


The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.

Original languageEnglish
Pages (from-to)170-175
Number of pages6
JournalJournal of Synchrotron Radiation
Issue number2
StatePublished - 19 Feb 2008


  • E-beam lithography
  • Electrodeposition
  • Fresnel zone plate
  • Nanofabrication
  • X-ray microscope


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