Fabrication of autocloned photonic crystals using electron-beam guns with ion-assisted deposition

Te Hung Chang, Sheng Hui Chen, Cheng Chung Lee, Husen Li Chen

Research output: Contribution to journalArticlepeer-review

14 Scopus citations


The autocloning technique is an attractive deposition method for the making of photonic crystals. With it various photonic crystals can be produced simply by changing the substrate periodicity and the structure of the stacking materials. We report on a method for the fabrication of autocloned photonic crystals. This method has better step-coverage, a higher deposition rate and a larger deposition area than can be achieved by the more traditional sputtering method and the periodic surface corrugation is preserved even after ion-assisted deposition (IAD) of multilayer stacks using E-beam gun evaporation. The shaping process can be freely controlled by controlling the IAD power and the ion source etching time. Ion source etching is a physical etching process which does not require any chemical reaction or dangerous reactive gas. The process parameters are described in this paper. The refractive index can be adjusted by changing the deposition rate and the substrate temperature during the deposition process. The deposition rate is about 0.7-1 nm/s for SiO2 which is almost ten times faster than that of the sputtering method. This makes this method good for the mass production of photonic crystals.

Original languageEnglish
Pages (from-to)1051-1055
Number of pages5
JournalThin Solid Films
Issue number6
StatePublished - 30 Jan 2008


  • Autocloning
  • Ion etching
  • Ion-assisted deposition
  • Photonic crystal
  • Scanning electron microscopy
  • Thin-film


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